Synthesis
and High-Pressure Mechanical Properties
of Superhard Rhenium/Tungsten Diboride Nanocrystals
Posted on 2019-08-19 - 18:45
Rhenium
diboride is an established superhard compound that can
scratch diamond and can be readily synthesized under ambient pressure.
Here, we demonstrate two synergistic ways to further enhance the already
high yield strength of ReB2. The first approach builds
on previous reports where tungsten is doped into ReB2 at
concentrations up to 48 at. %, forming a rhenium/tungsten diboride
solid solution (Re0.52W0.48B2). In
the second approach, the composition of both materials is maintained,
but the particle size is reduced to the nanoscale (40–150 nm).
Bulk samples were synthesized by arc melting above 2500 °C, and
salt flux growth at ∼850 °C was used to create nanoscale
materials. In situ radial X-ray diffraction was then
performed under high pressures up to ∼60 GPa in a diamond anvil
cell to study mechanical properties including bulk modulus, lattice
strain, and strength anisotropy. The differential stress for both
Re0.52W0.48B2 and nano ReB2 (n-ReB2) was increased compared to bulk ReB2. In addition, the lattice-preferred orientation of n-ReB2 was experimentally measured. Under non-hydrostatic compression,
n-ReB2 exhibits texture characterized by a maximum along
the [001] direction, confirming that plastic deformation is primarily
controlled by the basal slip system. At higher pressures, a range
of other slip systems become active. Finally, both size and solid-solution
effects were combined in nanoscale Re0.52W0.48B2. This material showed the highest differential stress
and bulk modulus, combined with suppression of the new slip planes
that opened at high pressure in n-ReB2.
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Lei, Jialin; Hu, Shanlin; Turner, Christopher L.; Zeng, Keyu; Yeung, Michael T.; Yan, Jinyuan; et al. (2019). Synthesis
and High-Pressure Mechanical Properties
of Superhard Rhenium/Tungsten Diboride Nanocrystals. ACS Publications. Collection. https://doi.org/10.1021/acsnano.9b02103
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AUTHORS (8)
JL
Jialin Lei
SH
Shanlin Hu
CT
Christopher L. Turner
KZ
Keyu Zeng
MY
Michael T. Yeung
JY
Jinyuan Yan
RK
Richard B. Kaner
ST
Sarah H. Tolbert