Molecular Origin of Mechanical Sensitivity of the
Reaction Rate in Anthracene Cyclophane Isomerization Reveals Structural
Motifs for Rational Design of Mechanophores
Version 4 2017-07-26, 08:19
Version 3 2017-01-24, 22:44
Version 2 2016-08-12, 14:22
Version 1 2016-08-09, 18:19
Posted on 2017-07-26 - 08:19
The
observed pressure sensitivity of the isomerization reaction
rate of bis-anthracene cyclophane photoisomer has attracted significant
attention in the rational design of mechanically sensitive materials.
However, the molecular origin of this sensitivity remains unclear.
We developed an ab initio molecular model to quantify the effect of
pressure on the reaction rate and to elucidate its molecular origin.
Pressure-induced deformations and changes along the reaction free-energy
surfaces are estimated from ab initio molecular dynamics trajectories.
Our model predicts a barrier reduction of ∼2 kcal/mol at 0.9
GPa (in agreement with experiment). The barrier reduction is linear
in the low-pressure regime (up to 2 GPa) but has a nonlinear dependence
at higher pressures. We find that pressure alters the reaction path
and that the mechanical sensitivity of the reaction rate is caused
by an uneven distribution of the free-energy increase along the reaction
surface. The uneven distribution primarily results from destabilization
of the reactant, which has a lower mechanical rigidity along a particular
deformation mode (flattening of anthracene rings as they are pushed
toward each other in the cyclophane framework). Exploiting similar
structural motifs to maximize rigidity differences along the reaction
coordinate represents a promising rational design strategy.
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Plotnikov, Nikolay V.; Martinez, Todd J. (2016). Molecular Origin of Mechanical Sensitivity of the
Reaction Rate in Anthracene Cyclophane Isomerization Reveals Structural
Motifs for Rational Design of Mechanophores. ACS Publications. Collection. https://doi.org/10.1021/acs.jpcc.6b04924
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