Giant
Stability Enhancement of CsPbX3 Nanocrystal
Films by Plasma-Induced Ligand Polymerization
Posted on 2019-09-11 - 19:46
All-inorganic CsPbX3 (X = Cl, Br, and I) nanocrystals
(NCs) are emerging as attractive semiconductor materials because of
their outstanding optical properties. The low resistance of CsPbX3 NCs to light, heat, oxygen, and water has been recognized
as a major obstacle to their practical applications. Here, we demonstrate
that the stability of CsPbX3 NC films can be dramatically
enhanced by Ar plasma treatment. It is revealed that plasma irradiation
can induce ligand polymerization in the NC films if the ligands contain
unsaturated carbon bonds. The ligand polymerization leads to encapsulation
of the NCs in the ligand polymers. Because of the precise localization
of the in situ ligand polymerization under plasma irradiation and
the high NC content in the films without extra additives, the polymerized
area can be precisely defined down to several micrometers. This enables
easy fabrication of high-resolution NC pixels for next generation
displays.
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Wang, Li; Zhu, Yiyuan; Liu, Hu; Gong, Jinhui; Wang, Wei; Guo, Siyu; et al. (2019). Giant
Stability Enhancement of CsPbX3 Nanocrystal
Films by Plasma-Induced Ligand Polymerization. ACS Publications. Collection. https://doi.org/10.1021/acsami.9b12591