posted on 2021-09-08, 19:04authored byJunhyuk Ahn, Sanghyun Jeon, Ho Kun Woo, Junsung Bang, Yong Min Lee, Steven J. Neuhaus, Woo Seok Lee, Taesung Park, Sang Yeop Lee, Byung Ku Jung, Hyungmok Joh, Mingi Seong, Ji-hyuk Choi, Ho Gyu Yoon, Cherie R. Kagan, Soong Ju Oh
Next-generation
devices and systems require the development and
integration of advanced materials, the realization of which inevitably
requires two separate processes: property engineering and patterning.
Here, we report a one-step, ink-lithography technique to pattern and
engineer the properties of thin films of colloidal nanocrystals that
exploits their chemically addressable surface. Colloidal nanocrystals
are deposited by solution-based methods to form thin films and a local
chemical treatment is applied using an ink-printing technique to simultaneously
modify (i) the chemical nature of the nanocrystal surface to allow
thin-film patterning and (ii) the physical electronic, optical, thermal,
and mechanical properties of the nanocrystal thin films. The ink-lithography
technique is applied to the library of colloidal nanocrystals to engineer
thin films of metals, semiconductors, and insulators on both rigid
and flexible substrates and demonstrate their application in high-resolution
image replications, anticounterfeit devices, multicolor filters, thin-film
transistors and circuits, photoconductors, and wearable multisensors.