posted on 2023-12-04, 16:04authored byGieop Lee, An-Na Cha, Sea Cho, Jeong Soo Chung, Young-Boo Moon, Jun-Seok Ha
In this study, halide vapor phase epitaxy with flow modulation
epitaxy (FME) was used to grow a 10 μm thick single-crystalline
α-Ga2O3 epilayer on a sapphire substrate.
By optimizing the interval time of the gas, highly crystalline thick
α-Ga2O3 epitaxial layers can be grown
without any cracks. The as-grown α-Ga2O3 was evaluated using scanning electron microscopy and atomic force
microscopy to analyze the improvement in the surface morphology and
roughness of the epitaxial layer, while X-ray diffraction was used
to evaluate the crystallinity. Under optimized O2 FME conditions,
the thick α-Ga2O3 film exhibited a lower
full width at half-maximum (fwhm) of 779 arcsec for the (101̅4)
plane compared to the (101̅4) plane fwhm values of 1137 and
925 arcsec obtained for the reference and HCl FME conditions, respectively.
The results indicated that the α-Ga2O3 epitaxial layer grown under the O2 FME conditions exhibited
the best quality. This confirms that the current approach to growing
high-quality α-Ga2O3 thick films is stable.