Ultra low dielectric polymers.pdf (716.54 kB)
Ultra low dielectric, self-cleansing and highly oleophobic POSS-PFCP aryl ether polymer composites
Ultra low dielectric constant (k 1⁄4 1.53) materials with self-cleansing properties were synthesized via incorporation of fluorodecyl-polyhedral oligomeric silsesquioxane (FD-POSS) into recently synthesized perfluorocyclopentenyl (PFCP) aryl ether polymers. Incorporation of fluorine rich, high free volume, and low surface energy POSS into a semifluorinated PFCP polymer matrix at various weight percentages resulted in a dramatic drop in dielectric constant, as well as a significant increase in hydrophobicity and oleophobicity of the system. These ultra-low dielectric self-cleansing materials (qtilt 1⁄4 38) were fabricated into electrospun mats from a solvent blend of fluorinated FD-POSS with PFCP polymers.
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- Organic chemistry not elsewhere classified
- Supramolecular chemistry
- Solid state chemistry
- Inorganic chemistry not elsewhere classified
- Inorganic materials (incl. nanomaterials)
- Macromolecular materials
- Structure and dynamics of materials
- Macromolecular and materials chemistry not elsewhere classified
- Organic chemical synthesis
- Colloid and surface chemistry
- Solution chemistry
- Other chemical sciences not elsewhere classified
Keywords
Polymer, fluoropolymer, polycondensation, addition-elimination reaction, perfluorocycloalkene, perfluorocyclopentene, perfluorocyclohexeneOrganic ChemistrySupramolecular ChemistrySolid State ChemistryInorganic Chemistry not elsewhere classifiedChemical Characterisation of MaterialsMacromolecular and Materials Chemistry not elsewhere classifiedOrganic Chemical SynthesisOrganic Chemistry not elsewhere classifiedColloid and Surface ChemistrySolution ChemistryIndustrial Chemistry
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