la404592z_si_001.pdf (1.12 MB)
Template-Assisted GLAD: Approach to Single and Multipatch Patchy Particles with Controlled Patch Shape
journal contribution
posted on 2013-12-23, 00:00 authored by Zhenping He, Ilona KretzschmarTemplate-assisted
glancing angle deposition (GLAD) is explored for the fabrication of
single and multipatch patchy particles with one or more patches of
controlled but asymmetric shape. The template is used to ensure the
formation of uniform patchy particles, whereas rotation of the template
gives access to a large number of asymmetric patch shapes caused by
the shadowing effect of the templating groove and/or the neighboring
particle. Careful analysis with a straightforward geometric model
reveals the effect of the angle of incidence, rotational angle, groove
size, and particle size on the patch shape. Initial magnetic field
assembly results are presented to illustrate the removal of patchy
particles from their template and accessibility to a large number
of patchy particles. Two-patch particles with overlapping patches
are also accessible by means of secondary metal vapor deposition.
The connectivity of these two patches on each particle and the predictable
size of the overlapping section provide access to functional patchy
particles. The combination of the template-assisted GLAD method with
rotation of the template and secondary evaporation is demonstrated
to be a good method for fabricating patchy particles with a variety
of asymmetric patch shapes, sizes, and multipatches where every particle
of a batch carries exactly the same patch pattern and thereby provides
valuable input on experimentally accessible patch shapes for future
experimental and computational studies of patchy particles.