posted on 2016-06-15, 11:20authored byJin Wu, Chihao Liow, Kai Tao, Yuanyuan Guo, Xiaotian Wang, Jianmin Miao
Fabrication
of large-area, highly orderly, and high-resolution
nanostructures in a cost-effective fashion prompts advances in nanotechnology.
Herein, for the first time, we demonstrate a unique strategy to prepare
a long-range highly regular polymer lens from photoresist nanotrenches
based templates, which are obtained from underexposure. The relationship
between exposure dose and the cross-sectional morphology of produced
photoresist nanostructures is revealed for the first time. The polymer
lens arrays are repeatedly used for rapid generation of sub-100 nm
nanopatterns across centimeter-scale areas. The light focusing properties
of the nanoscale polymer lens are investigated by both simulation
and experiment. It is found that the geometry, size of the lens, and
the exposure dose can be deployed to adjust the produced feature size,
spacing, and shapes. Because the polymer lenses are derived from top-down
photolithography, the nearly perfect long-range periodicity of produced
nanopatterns is ensured, and the feature shapes can be flexibly designed.
Because this nanolithographic strategy enables subwavelength periodical
nanopatterns with controllable feature size, geometry, and composition
in a cost-effective manner, it can be optimized as a viable and potent
nanofabrication tool for various technological applications.