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High Mobility Flexible Graphene Field-Effect Transistors with Self-Healing Gate Dielectrics

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posted on 2012-05-22, 00:00 authored by Chun-Chieh Lu, Yung-Chang Lin, Chao-Hui Yeh, Ju-Chun Huang, Po-Wen Chiu
A high-mobility low-voltage graphene field-effect transistor (FET) array was fabricated on a flexible plastic substrate using high-capacitance natural aluminum oxide as a gate dielectric in a self-aligned device configuration. The high capacitance of the native aluminum oxide and the self-alignment, which minimizes access resistance, yield a high current on/off ratio and an operation voltage below 3 V, along with high electron and hole mobility of 230 and 300 cm2/V·s, respectively. Moreover, the native aluminum oxide is resistant to mechanical bending and exhibits self-healing upon electrical breakdown. These results indicate that self-aligned graphene FETs can provide remarkably improved device performance and stability for a range of applications in flexible electronics.

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