Photoresist
Contact Patterning of Quantum Dot Films
Version 2 2018-10-01, 15:49
Version 1 2018-09-24, 12:33
Posted on 2018-10-01 - 15:49
Scalable and cost-effective
protocols to pattern and integrate
colloidal quantum dots (QDs) with high resolution have been challenging
to establish. While their solubility can facilitate certain processes
such as spin-casting into thin films, it also makes them incompatible
with many conventional patterning techniques including photolithography
that require solution processing. In this work, we present “photoresist
(PR) contact patterning”, a dry means to pattern QD films over
large areas with high resolution while maintaining desired properties.
Here, a PR layer on an elastomer substrate is patterned by conventional
photolithography and used as a dry contact stamp to selectively peel
off QDs in the contact regions, leaving behind a QD film with the
negative of the PR pattern. Once patterned, QD films are readily transferred
and integrated on foreign substrates by subsequent transfer printing
processes. Patterned PR layers can also be transferred from elastomer
substrates onto QD films and used as masking layers for subsequent
deposition and patterning of additional materials, e.g., patterned metal electrodes or charge transport
layers for QD-based devices. The study of the interfacial mechanics
and energy of materials associated with PR contact patterning reveals
why a lithographically patterned PR is superior for high-resolution
QD film patterning. Applicability of PR contact patterning is demonstrated
through the fabrication of red, green, and blue (RGB) QD light-emitting
diode pixels. PR contact patterning presented in this work not only
allows dry patterning of QD films but also enables high-resolution
integration of functional multistack structures for future QD-based
electronic and optoelectronic devices.
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Keum, Hohyun; Jiang, Yiran; Park, Jun Kyu; Flanagan, Joseph C.; Shim, Moonsub; Kim, Seok (2018). Photoresist
Contact Patterning of Quantum Dot Films. ACS Publications. Collection. https://doi.org/10.1021/acsnano.8b04462
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AUTHORS (6)
HK
Hohyun Keum
YJ
Yiran Jiang
JP
Jun Kyu Park
JF
Joseph C. Flanagan
MS
Moonsub Shim
SK
Seok Kim
CATEGORIES
- Biochemistry
- Physical Sciences not elsewhere classified
- Cell Biology
- Biotechnology
- Evolutionary Biology
- Environmental Sciences not elsewhere classified
- Chemical Sciences not elsewhere classified
- Biological Sciences not elsewhere classified
- Developmental Biology
- Inorganic Chemistry
- Infectious Diseases
- Plant Biology
- Computational Biology