Lowering
Band Gap of an Electroactive Metal–Organic Framework via Complementary
Guest Intercalation
Posted on 2017-09-05 - 00:00
A new
honeycomb-shaped electroactive metal–organic framework (MOF)
has been constructed from an electron deficient naphthalenediimide
(NDI) ligand equipped with two terminal salicylic acid groups. π-Intercalation
of electron-rich planar tetrathiafulvalene (TTF) guests between the
NDI ligands stacked along the walls lowers the electronic band gap
of the material by ca. 1 eV. An improved electron delocalization through
the guest-mediated π-donor/acceptor stacks is attributed to
the diminished band gap of
the doped material, which forecasts an improved electrical conductivity.
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Guo, Zhiyong; Panda, Dillip K.; Gordillo, Monica A.; Khatun, Amina; Wu, Hui; Zhou, Wei; et al. (2017). Lowering
Band Gap of an Electroactive Metal–Organic Framework via Complementary
Guest Intercalation. ACS Publications. Collection. https://doi.org/10.1021/acsami.7b07292