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van der Waals Metal Contacts for Characterization and Optoelectronic Application of Metal Halide Perovskite Thin Films
journal contribution
posted on 2022-10-06, 16:18 authored by Joo-Hong Lee, Jin-Wook LeeThe metal contacts on metal halide perovskite thin films
are often
formed through physical vapor deposition (PVD) processes for investigation
of the film properties or construction of optoelectronic devices.
However, the PVD processes generate high-energy metal atoms, directly
bombarding the film surface, potentially causing unintended damage
in the film. In this study, we performed systematic investigation
on the impact of a PVD-processed metal contact on the optoelectronic
properties of underlying organic–inorganic hybrid perovskite
thin films. We adopted a physically laminated van der Waals metal
contact for comparison to enable quantitative analysis. Through space-charge-limited
current measurement, we demonstrated the defect density increases
by 26–48% on average after formation of the metal contact by
the PVD process. In-situ photoluminescence measurements
unraveled that the generated defects easily migrate under the electric
field to seriously deteriorate the performance and stability of photodetectors.
This study highlights the importance of the intact junction between
the perovskite and metal contacts for characterization and optoelectronic
application of perovskite thin films.
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Keywords
physical vapor depositionphotoluminescence measurements unraveledlimited current measurementenable quantitative analysisdefect density increases26 – 48energy metal atomsprocessed metal contactperovskite thin filmsperformed systematic investigationmetal contactmetal contactssitu seriously deteriorateoptoelectronic propertiesoptoelectronic devicesoptoelectronic applicationoften formedintact junctionelectric fielddirectly bombarding