α‑Gallium Oxide Films on Microcavity-Embedded Sapphire Substrates Grown by Mist Chemical Vapor Deposition for High-Breakdown Voltage Schottky Diodes

α-Gallium oxide, with its large band gap energy, is a promising material for utilization in power devices. Sapphire, which has the same crystal structure as α-Ga₂O₃, has been used as a substrate for α-Ga₂O₃ epitaxial growth. However, lattice and thermal expansion coefficient mismatches generate a high density of threading dislocations (TDs) and cracks in films. Here, we demonstrated the growth of α-Ga₂O₃ films with reduced TD density and residual stress on microcavity-embedded sapphire substrates (MESS). We fabricated the two types of substrates with microcavities: diameters of 1.5 and 2.2 μm, respectively. We confirmed that round conical-shaped cavities with smaller diameters are beneficial for the lateral overgrowth of α-Ga₂O₃ crystals with lower TD densities by mist chemical vapor deposition. We could obtain crack-free high-crystallinity α-Ga₂O₃ films on MESS, while the direct growth on a bare sapphire substrate resulted in an α-Ga₂O₃ film with a number of cracks. TD densities of α-Ga₂O₃ films on MESS with 1.5 and 2.2 μm cavities were measured to be 1.77 and 6.47 × 10⁸ cm^–2, respectively. Furthermore, cavities in MESS were certified to mitigate the residual stress via the redshifted Raman peaks of α-Ga₂O₃ films. Finally, we fabricated Schottky diodes based on α-Ga₂O₃ films grown on MESS with 1.5 and 2.2 μm cavities, which exhibited high breakdown voltages of 679 and 532 V, respectively. This research paves the way to fabricating Schottky diodes with high breakdown voltages based on high-quality α-Ga₂O₃ films.