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Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application

journal contribution
posted on 2010-11-01, 00:00 authored by Xiaokai HuXiaokai Hu, Z Song, H Wang, W Liu, Z Zhang
Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application

History

Journal

Microelectronic engineering

Volume

87

Issue

9

Pagination

1751 - 1755

Publisher

Elsevier

Location

Amsterdam, The Netherlands

Publisher DOI

ISSN

0167-9317

Language

eng

Publication classification

C1.1 Refereed article in a scholarly journal

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    Research Publications

    Categories

    Keywords

    silicacolloidal abrasivesCMPgrowthintegrated circuitCondensed Matter Physics

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