DEPOSITION OF THE STOICHIOMETRIC COATINGS BY REACTIVE MAGNETRON SPUTTERING
DEPOSITION OF THE STOICHIOMETRIC COATINGS BY REACTIVE
MAGNETRON SPUTTERING
The investigations of the reactive magnetron depositing of the stoichiometric coatings “metal-metalloid”
were done. The dependences between sputtering parameters of a target and processes of plasmo-chemical formation on the surface of sample “metal-metalloid” and formations of coatings of the appropriate structure were investigated.
Experimental data on stoichiometric coatings AlN, Al2
O3
, TiN, TiO2
is given. Features of reactive
magnetron deposition and investigation results for obtaining of coatings with pregiven properties in
particular for providing stability and controllability of coating deposition processes in time.
Keywords: reactive magnetron sputtering, coatings, oxide, nitride compositions.
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