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Characterizing Patterned Block Copolymer Thin Films with Soft X‑rays

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journal contribution
posted on 2017-05-25, 00:00 authored by Daniel F. Sunday, Jiaxing Ren, Christopher D. Liman, Lance D. Williamson, Roel Gronheid, Paul F. Nealey, R. Joseph Kline
The directed self-assembly (DSA) of block copolymers (BCPs) is a potential solution for patterning critical features for integrated circuits at future technology nodes. For this process to be implemented, there needs to be a better understanding of how the template guides the assembly and induces subsurface changes in the lamellar structure. Using a rotational transmission X-ray scattering measurement coupled with soft X-rays to improve contrast between polymer components, the impact of the ratio of the guiding stripe width (W) to the BCP pitch (L0) was investigated. For W/L0 < 1, continuous vertical lamella were observed, with some fluctuations in the interface profile near the template that smoothed out further up the structure. Near W/L0 ≈ 1.5, the arrangement of the lamella shifted, moving from polystyrene centered on the guiding stripe to poly­(methyl methacrylate) centered on the guiding stripe.