posted on 2012-03-08, 00:00authored byM. Komarneni, J. Shan, A. Chakradhar, E. Kadossov, S. Cabrini, U. Burghaus
Electron beam lithography was used to nanofabricate 12
and 63 nm
Cu clusters supported on silica (model nanoarray catalysts). The Cu
clusters could reversibly be oxidized and reduced at ultrahigh vacuum
conditions. The chemical activity of these clusters was probed by
Auger and X-ray photoelectron spectroscopy, thermal desorption spectroscopy,
and molecular beam scattering. CO was used as the probe molecule.
Scanning electron microscopy was used to obtain cluster size distributions.
CO adsorption is molecular and nonactivated. CO binding energies on
the oxidic clusters are larger than for the metallic clusters. Adsorption
transients, recorded as a function of surface temperature and CO impact
energy, are consistent with precursor models, as expected from the
so-called capture zone model (CZM). Cluster size effects are evident,
as predicted by the CZM. However, unexpectedly, the CO saturation
coverage does not simply scale with the cluster area but depends also
on the rim length of the deposits. Metallic Cu clusters are more reactive
than oxidic clusters, in part not only due to the cluster size effect
but apparently also because of the electronic effect.