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Isotropic plasma atomic layer etching of Al2O3
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posted on 2020-10-21, 13:52
authored by
Nicholas Chittock
Nicholas Chittock
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
Funding
NWO Project 17124 "Atomic Layer Etching: Novel Plasma Processes for Anisotropic ánd Isotropic Etching"
History
Publisher
4TU.ResearchData
Organizations
Eindhoven University of Technology
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Categories
Atomic, Molecular, Nuclear, Particle and Plasma Physics
Keywords
Etch Rate
Atomic, Molecular, Nuclear, Particle and Plasma Physics
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CC0
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