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Refractive index determination by coherence scanning interferometry

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journal contribution
posted on 2016-06-17, 13:53 authored by Hiro Yoshino, Piotr Kaminski, Roger Smith, Michael WallsMichael Walls, D. Mansfield
Coherence scanning interferometry is established as a powerful noncontact, three-dimensional, metrology technique used to determine accurate surface roughness and topography measurements with subnanometer precision. The helical complex field (HCF) function is a topographically defined helix modulated by the electrical field reflectance, originally developed for the measurement of thin films. An approach to extend the capability of the HCF function to determine the spectral refractive index of a substrate or absorbing film has recently been proposed. In this paper, we confirm this new capability, demonstrating it on surfaces of silicon, gold, and a gold/ palladium alloy using silica and zirconia oxide thin films. These refractive index dispersion measurements show good agreement with those obtained by spectroscopic ellipsometry

Funding

Engineering and Physical Sciences Research Council (EPSRC) (EP/J017361/1, EP/M014297/1).

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Published in

Applied Optics

Volume

55

Issue

15

Pages

4253 - 4260

Citation

YOSHINO, H. ... et al., 2016. Refractive index determination by coherence scanning interferometry. Applied Optics, 55 (15), pp. 4253 - 4260.

Publisher

Optical Society of America

Version

  • VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution 4.0 International (CC BY 4.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/ by/4.0/

Acceptance date

2016-03-21

Publication date

2016

Notes

Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

ISSN

1559-128X

Language

  • en

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