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Long-Term Stable 2H-MoS2 Dispersion: Critical Role of Solvent for Simultaneous Phase Restoration and Surface Functionalization of Liquid-Exfoliated MoS2
journal contribution
posted on 2017-08-18, 08:13 authored by Dong Min Sim, Hyeuk Jin Han, Soonmin Yim, Min-Jae Choi, Jaebeom Jeon, Yeon Sik JungChemical exfoliation
approaches such as Li-intercalation for the
production of two-dimensional MoS2 are highly attractive
due to their high yield of monolayer forms, cost-effectiveness, and
mass-scalability. However, the loss of the semiconducting property
and poor dispersion stability in solvent have limited the extent of
their potential applications. Here, we report simultaneous phase recovery
and surface functionalization for the preparation of a highly stable
2H-MoS2 dispersion in water. This study shows that high-yield
restoration of the semiconducting 2H phase from a chemically exfoliated
MoS2 (ce-MoS2) can be induced by a mild-temperature
(180 °C) solvent thermal treatment in N-methyl-2-pyrrolidone
(NMP). In addition to a phase
transition, this solvent thermal treatment in NMP realizes concurrent
surface functionalization of the 2H-MoS2 surface, which
provides an outstanding dispersion stability to 2H-MoS2 in water for more than 10 months. Finally, we report the humidity
sensor based on the functionalized 2H-MoS2, which shows
a substantial response enhancement compared with a nonfunctionalized
2H-MoS2 or ce-MoS2.
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2 H-MoS 2 surfacece-MoS 2Liquid-Exfoliated MoS 2 Chemical exfoliation approachesnonfunctionalized 2 H-MoS 2semiconducting 2 H phasefunctionalized 2 H-MoS 22 H-MoS 2NMPexfoliated MoS 2surface functionalization2 H-MoS 2 dispersiondispersion stabilitySimultaneous Phase RestorationLong-Term Stable 2 H-MoS 2 Dispersion
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