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Independently Controlling Protein Dot Size and Spacing in Particle Lithography
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posted on 2012-06-26, 00:00 authored by Zachary
R. Taylor, Joel C. Keay, Ernest S. Sanchez, Matthew B. Johnson, David W. SchmidtkeParticle lithography is a relatively simple, inexpensive
technique
used to pattern inorganics, metals, polymers, and biological molecules
on the micro- and nanometer scales. Previously, we used particle lithography
to create hexagonal patterns of protein dots in a protein resistant
background of methoxy-poly(ethylene glycol)-silane (mPEG-sil). In
this work, we describe a simple heating procedure to overcome a potential
limitation of particle lithography: the simultaneous change in feature
size and center-to-center spacing as the diameter of the spheres used
in the lithographic mask is changed. Uniform heating was used to make
single-diameter protein patterns with dot sizes of approximately 2–4
or 2–8 μm, depending on the diameter of the spheres used
in the lithographic mask, while differential heating was used to make
a continuous gradient of dot sizes of approximately 1–9 μm
on a single surface. We demonstrate the applicability of these substrates
by observing the differences in neutrophil spreading on patterned
and unpatterned protein coated surfaces.