Nanopatterning of Mobile Lipid Monolayers on Electron-Beam-Sculpted Teflon AF Surfaces Mehrnaz Shaali Samuel Lara-Avila Paul Dommersnes Alar Ainla Sergey Kubatkin Aldo Jesorka 10.1021/nn5050867.s001 https://acs.figshare.com/articles/journal_contribution/Nanopatterning_of_Mobile_Lipid_Monolayers_on_Electron_Beam_Sculpted_Teflon_AF_Surfaces/2193322 Direct electron-beam lithography is used to fabricate nanostructured Teflon AF surfaces, which are utilized to pattern surface-supported monolayer phospholipid films with 50 nm lateral feature size. In comparison with unexposed Teflon AF coatings, e-beam-irradiated areas show reduced surface tension and surface potential. For phospholipid monolayer spreading experiments, these areas can be designed to function as barriers that enclose unexposed areas of nanometer dimensions and confine the lipid film within. We show that the effectiveness of the barrier is defined by pattern geometry and radiation dose. This surface preparation technique represents an efficient, yet simple, nanopatterning strategy supporting studies of lipid monolayer behavior in ultraconfined spaces. The generated structures are useful for imaging studies of biomimetic membranes and other specialized surface applications requiring spatially controlled formation of self-assembled, molecularly thin films on optically transparent patterned polymer surfaces with very low autofluorescence. 2015-02-24 00:00:00 feature size surface preparation technique surface applications enclose unexposed areas biomimetic membranes polymer surfaces phospholipid monolayer Mobile Lipid Monolayers nanostructured Teflon AF surfaces imaging studies surface tension 50 nm unexposed Teflon AF coatings ultraconfined spaces radiation dose pattern geometry lipid monolayer behavior lipid film nanopatterning strategy nanometer dimensions