Nanopatterning of Mobile Lipid Monolayers on Electron-Beam-Sculpted Teflon AF Surfaces
Mehrnaz Shaali
Samuel Lara-Avila
Paul Dommersnes
Alar Ainla
Sergey Kubatkin
Aldo Jesorka
10.1021/nn5050867.s001
https://acs.figshare.com/articles/journal_contribution/Nanopatterning_of_Mobile_Lipid_Monolayers_on_Electron_Beam_Sculpted_Teflon_AF_Surfaces/2193322
Direct electron-beam lithography is used to fabricate nanostructured Teflon AF surfaces, which are utilized to pattern surface-supported monolayer phospholipid films with 50 nm lateral feature size. In comparison with unexposed Teflon AF coatings, e-beam-irradiated areas show reduced surface tension and surface potential. For phospholipid monolayer spreading experiments, these areas can be designed to function as barriers that enclose unexposed areas of nanometer dimensions and confine the lipid film within. We show that the effectiveness of the barrier is defined by pattern geometry and radiation dose. This surface preparation technique represents an efficient, yet simple, nanopatterning strategy supporting studies of lipid monolayer behavior in ultraconfined spaces. The generated structures are useful for imaging studies of biomimetic membranes and other specialized surface applications requiring spatially controlled formation of self-assembled, molecularly thin films on optically transparent patterned polymer surfaces with very low autofluorescence.
2015-02-24 00:00:00
feature size
surface preparation technique
surface applications
enclose unexposed areas
biomimetic membranes
polymer surfaces
phospholipid monolayer
Mobile Lipid Monolayers
nanostructured Teflon AF surfaces
imaging studies
surface tension
50 nm
unexposed Teflon AF coatings
ultraconfined spaces
radiation dose
pattern geometry
lipid monolayer behavior
lipid film
nanopatterning strategy
nanometer dimensions